MA100/150 Automatic Mask Aligner for Substrates and Wafers up to 150mm

MA100/150 Automatic Mask Aligner for Substrates and Wafers up to 150mm The MA100/150e Gen2 for Compound Semiconductor, HB-LEDs, Power Devices, RF-MEMS devices etc., enables exceptional process scalability with an industry leading throughput of 145 wafers per hour, features and capabilities include: - Optimised for up to 150mm (6") wafers - Multi-size tooling minimises time required for wafer size changes - Simultaneous handling of 3 wafers allows > 145 wph. including auto-alignment and exposure - Alignment function tailored for LED manufacturing, providing optimal contrast for different wafer types - The 'Line Alignment' function for sapphire wafers aligns scribe lines precisely to the photo mask - SUSS Diffraction Reducing Optics allows proximity printing for challenging resolution requirements

For more information on MA100/150 Automatic Mask Aligner for Substrates and Wafers up to 150mm talk to Inseto (UK) Ltd